发明名称 |
APPARATUS FOR TREATING REACTIVE GAS |
摘要 |
<p>PURPOSE:To remove the reactive gas at a high rate and to prevent the reactive gas from flowing out of the system by reacting the gas (such as UF6) with spray of water etc. in the second reaction chamber formed between a single cylindrical reaction vessel and the first cylindrical reaction chamber installed coaxially in the reaction vessel.</p> |
申请公布号 |
JPS52145375(A) |
申请公布日期 |
1977.12.03 |
申请号 |
JP19760062275 |
申请日期 |
1976.05.31 |
申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
TANIDA KAZUO;OOMINE TOSHIMITSU |
分类号 |
B01D3/26;B01D53/18;B01J10/00 |
主分类号 |
B01D3/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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