发明名称 EQUIPMENT FOR PLASMA DEPO SITION
摘要 PURPOSE:To obtain the grown membrane of stable characteristics without receiving the damage of the sample and the grown membrane due to the irradiation, by arranging the screening plate for electric field consisting of perforated plate or net made of electroconductive material between the plasma generating area and the substrate on which the prescribed membrane shoud be coated.
申请公布号 JPS52143981(A) 申请公布日期 1977.11.30
申请号 JP19760060250 申请日期 1976.05.25
申请人 NIPPON ELECTRIC CO 发明人 NAKAMAE MASAHIKO
分类号 C23C16/50;C23C16/507 主分类号 C23C16/50
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