发明名称 METHOD FOR DETERMINING WHETHER HOLES IN INSULATED LAYER OF SEMICONDUCTOR SUBSTRATE ARE Y OPEN
摘要 <p>A non-destructive test determines whether the holes in an insulated layer on a semiconductor wafer are fully open to provide communication through the insulated layer to the wafer. A conductor extends from each hole to another hole. Current is supplied to a plurality of these conductors in series to enable the resistance to be measured with the current having to flow through the surface of the wafer from the end of one conductor within the hole to the end of another conductor within the hole since the ends are spaced from each other. If any hole is not fully open, then the insulated layer prevents the flow of current to indicate by a high resistance that this portion of the wafer is not satisfactory.</p>
申请公布号 CA1019466(A) 申请公布日期 1977.10.18
申请号 CA19740213807 申请日期 1974.11.15
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BAKER, THEODORE H.;STEVENS, RICHARD C.;TZOU, ALBERT J.
分类号 H01L21/66;G01R27/02;G01R31/26;H01L21/027;H01L21/28 主分类号 H01L21/66
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