| 发明名称 |
PHOTORESIST COATING METHOD |
| 摘要 |
PURPOSE:To coat a photoresist in uniform thickness on a support by mechanically removing a coated film of a silver halide emulsion in its circumference. |
| 申请公布号 |
JPS5217814(A) |
申请公布日期 |
1977.02.10 |
| 申请号 |
JP19750092394 |
申请日期 |
1975.07.29 |
| 申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
SATOU MASATOSHI;FUJII ITSUO;IMAI KAZUHIRO |
| 分类号 |
G03C1/74;B05C11/08;B05D1/40;G03F7/16 |
主分类号 |
G03C1/74 |
| 代理机构 |
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代理人 |
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| 地址 |
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