发明名称 MULTILAYER FILM REFLECTOR AND EUV LIGHT SOURCE
摘要 PROBLEM TO BE SOLVED: To provide a multilayer film reflector excellent in durability by preventing the multilayer film from being deteriorated caused by collisions of particles such as ions generated from an EUV light-source.SOLUTION: The multilayer film reflector includes a multilayer film, formed by alternately laminating heavy element layers and light element layers on a substrate, having a Bragg diffraction effect. For the heavy element layers, any one of niobium, a niobium compound, and a niobium alloy is used.SELECTED DRAWING: Figure 1
申请公布号 JP2016111035(A) 申请公布日期 2016.06.20
申请号 JP20140243709 申请日期 2014.12.02
申请人 NTT ADVANCED TECHNOLOGY CORP 发明人 ICHIMARU SATOSHI;HATAYAMA MASATOSHI
分类号 H01L21/027;G02B5/08;G03F1/24;G03F1/52;G21K1/00;G21K1/06;H05G2/00 主分类号 H01L21/027
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