发明名称 Microelectromechanical structure with motion limiter
摘要 A microelectromechanical structure, comprises a first element that includes a first element surface, and a second element that includes a second element surface, and an element gap between the first element surface and the second element surface. At least one of the first element and the second element is mobile. One of the first and second element surfaces includes a convex contact surface and the other one of the first and second element surfaces includes a concave contact surface.
申请公布号 US9415998(B2) 申请公布日期 2016.08.16
申请号 US201514630801 申请日期 2015.02.25
申请人 MURATA MANUFACTURING CO., LTD. 发明人 Ahtee Ville;Rytkönen Ville Pekka
分类号 H01L29/84;G01C19/5719;G01P15/097;B81B3/00;H04R23/00;G01P15/125;G01P15/08 主分类号 H01L29/84
代理机构 Squire Patton Boggs (US) LLP 代理人 Squire Patton Boggs (US) LLP
主权项 1. A microelectromechanical structure, comprising: a first element that includes a first element surface, and a second element that includes a second element surface, wherein at least one of the first element and the second element is mobile; an element gap between the first element surface and the second element surface; wherein one of the first and second element surfaces includes a convex contact surface and the other one of the first and second element surfaces includes a concave contact surface; the convex contact surface includes a protrusion, and the concave contact surface includes an indentation; the surface of the protrusion includes a first curved region; the surface of the indentation includes a second curved region; a radius of curvature in a vertex of the first curved region is a first radius of curvature; a radius of curvature in a vertex of the second curved region is a second radius of curvature; the first radius of curvature is smaller than the second radius of curvature such that the ratio of the first radius of curvature and the second radius of curvature is within a range of 0.5 to 1, and both the first radius of curvature and the second radius of curvature are at least two times the width of the element gap; the microelectromechanical structure includes two impact elements for providing successively activated motion limiter stages, at least one of the impact elements including the convex contact surface and the concave contact surface; a first impact element includes a flexural element and is induced into contact by closing of a first limiter gap in response to displacement of the mobile element in a specific direction; a second impact element is induced into contact by closing of a second limiter gap in response to displacement of the mobile element in the specific direction, the second limiter gap being greater than the first limiter gap.
地址 Nagaokakyo-Shi, Kyoto JP