发明名称 CRYSTAL GROWTH METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for growing a crystal by which an electrically conductive GaAs substance can be used for manufacturing a light-producing element of three-family represented by InxGa(1x)N (0<=X<=1). SOLUTION: In a vapor phase growth method, a crystal is growth while a substrate is heated up to 900 deg.C or more. When a GaAS crystal as growing substrate is heated up to the temperature, arsine gas is sprayed on the top of the substrate. If the growing substrate is heated from the room temperature, arsine gas is introducing at the time when the temperature of the substrate exceeds approximately 600 deg.C. In a process of growing a target crystal on the growing substrate, no arsine gas is introduced which has no bearing on the target metal.
申请公布号 JP2000182969(A) 申请公布日期 2000.06.30
申请号 JP19980358893 申请日期 1998.12.17
申请人 SUMITOMO METAL MINING CO LTD 发明人 IINO TAKAYUKI
分类号 C30B25/18;C30B29/38;H01L21/205;H01L33/32 主分类号 C30B25/18
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