发明名称 Methods of fabricating glass articles by laser damage and etching
摘要 Methods of forming a glass article are disclosed. In one embodiment, a method of forming a glass article includes translating a pulsed laser beam on a glass substrate sheet to form a laser damage region between a first surface and a second surface of the glass substrate sheet. The method further includes applying an etchant solution to the glass substrate sheet to remove a portion of the glass substrate sheet about the laser damage region. The method may further include strengthening the glass substrate sheet by an ion-exchange strengthening process, and coating the glass substrate sheet with an acid-resistant coating. Also disclosed are methods where the laser damage region has an initial geometry that changes to a desired geometry following the reforming of the glass substrate sheet such that the initial geometry of the laser damage region compensates for the bending of the glass substrate sheet.
申请公布号 US9346706(B2) 申请公布日期 2016.05.24
申请号 US201314092544 申请日期 2013.11.27
申请人 CORNING INCORPORATED 发明人 Bazemore Brandon A.;Decker Jeffrey A.;Feng Jiangwei;Guilfoyle Diane Kimberlie;Harvey Daniel Ralph;Jin Yuhui;Joubaud Laurent;Lafosse Xavier;Streltsov Alexander Mikhailovich;Ukrainczyk Ljerka
分类号 C03C15/00;C03B23/00;C03C21/00;C03C23/00;C03C3/083;C03C3/085;C03C3/091;C03C3/097;B23K26/00;B23K26/38;B23K26/36;B23K26/40;C03B23/023;C03B23/025;C03B23/03;C03B23/035 主分类号 C03C15/00
代理机构 代理人 Haran John T.
主权项 1. A method of forming a glass article, comprising: providing a glass substrate sheet; translating a pulsed laser beam on the glass substrate sheet to form a laser damage region extending from a first surface of the glass substrate sheet to a second surface of the glass substrate sheet, wherein: the laser damage region comprises a plurality of defect lines, wherein each defect line is formed at a different depth of the glass substrate sheet; and applying the glass substrate sheet with an etchant solution comprising about 1M to about 3M of hydrofluoric acid and hydrochloric acid, wherein: a concentration of the hydrochloric acid is less than about 1M if a concentration of the hydrofluoric acid is greater than about 2M; andthe concentration of the hydrochloric acid is between about 1M and about 3M if the concentration of the hydrofluoric acid is less than about 2M.
地址 Corning NY US