发明名称 |
Methods of fabricating glass articles by laser damage and etching |
摘要 |
Methods of forming a glass article are disclosed. In one embodiment, a method of forming a glass article includes translating a pulsed laser beam on a glass substrate sheet to form a laser damage region between a first surface and a second surface of the glass substrate sheet. The method further includes applying an etchant solution to the glass substrate sheet to remove a portion of the glass substrate sheet about the laser damage region. The method may further include strengthening the glass substrate sheet by an ion-exchange strengthening process, and coating the glass substrate sheet with an acid-resistant coating. Also disclosed are methods where the laser damage region has an initial geometry that changes to a desired geometry following the reforming of the glass substrate sheet such that the initial geometry of the laser damage region compensates for the bending of the glass substrate sheet. |
申请公布号 |
US9346706(B2) |
申请公布日期 |
2016.05.24 |
申请号 |
US201314092544 |
申请日期 |
2013.11.27 |
申请人 |
CORNING INCORPORATED |
发明人 |
Bazemore Brandon A.;Decker Jeffrey A.;Feng Jiangwei;Guilfoyle Diane Kimberlie;Harvey Daniel Ralph;Jin Yuhui;Joubaud Laurent;Lafosse Xavier;Streltsov Alexander Mikhailovich;Ukrainczyk Ljerka |
分类号 |
C03C15/00;C03B23/00;C03C21/00;C03C23/00;C03C3/083;C03C3/085;C03C3/091;C03C3/097;B23K26/00;B23K26/38;B23K26/36;B23K26/40;C03B23/023;C03B23/025;C03B23/03;C03B23/035 |
主分类号 |
C03C15/00 |
代理机构 |
|
代理人 |
Haran John T. |
主权项 |
1. A method of forming a glass article, comprising:
providing a glass substrate sheet; translating a pulsed laser beam on the glass substrate sheet to form a laser damage region extending from a first surface of the glass substrate sheet to a second surface of the glass substrate sheet, wherein:
the laser damage region comprises a plurality of defect lines, wherein each defect line is formed at a different depth of the glass substrate sheet; and applying the glass substrate sheet with an etchant solution comprising about 1M to about 3M of hydrofluoric acid and hydrochloric acid, wherein:
a concentration of the hydrochloric acid is less than about 1M if a concentration of the hydrofluoric acid is greater than about 2M; andthe concentration of the hydrochloric acid is between about 1M and about 3M if the concentration of the hydrofluoric acid is less than about 2M. |
地址 |
Corning NY US |