Fluid handling structure, lithographic apparatus and device manufacturing method

摘要

A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

主权项

1. A fluid handling structure for a lithographic apparatus, the fluid handling structure having a plurality of openings arranged, in plan, in a line around the center of the fluid handling structure, the fluid handling structure configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table configured to support the substrate, wherein outward, relative to the center of the fluid handling structure, of the line of openings is a damper, the damper comprising a surface, nearest the facing surface, having a width that varies along the line of openings, the width being defined between the line of openings and an opposing damper edge, and the damper is configured to have a liquid meniscus in contact with the damper surface that strays beyond the line of openings and that extends toward the facing surface.