| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning/drying device which uniformizes an exhaust environment around a substrate.SOLUTION: A substrate cleaning/drying device of the invention includes: a substrate holding mechanism 1 which holds a substrate W; a rotary mechanism 2 which rotates the substrate holding mechanism 1; a cylindrical cup 3 which encloses a periphery part of the substrate W; and a gas ejector 16 disposed below the substrate W. The gas ejector 16 includes at least one gas exhaust port 19a disposed along an entire periphery of the substrate W and exhausts a gas from the gas exhaust port 19a to the lower side, thereby inducing downward airflow in a space between the periphery part of the substrate W and the cylindrical cup 3. |
