发明名称 SELF-ASSEMBLY NANOPATTERN MANUFACTURING METHOD USING LIGHT
摘要 The present invention relates to a nanopattern manufacturing method for forming a pattern by increasing the temperature of a self-assembling polymer through light irradiation, the nanopattern manufacturing method inducing directed self-assembly after a complete disordered state is made by inducing χΝ of a self-assembling polymer to be 10.5 or less at the part irradiated with light.
申请公布号 WO2016089128(A1) 申请公布日期 2016.06.09
申请号 WO2015KR13135 申请日期 2015.12.03
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 KIM, SANG OUK;JIN, HYEONG MIN;LEE, KEON JAE;LEE, SEUNG HYUN;KIM, JU YOUNG
分类号 H01L21/027 主分类号 H01L21/027
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