SELF-ASSEMBLY NANOPATTERN MANUFACTURING METHOD USING LIGHT
摘要
The present invention relates to a nanopattern manufacturing method for forming a pattern by increasing the temperature of a self-assembling polymer through light irradiation, the nanopattern manufacturing method inducing directed self-assembly after a complete disordered state is made by inducing χΝ of a self-assembling polymer to be 10.5 or less at the part irradiated with light.
申请公布号
WO2016089128(A1)
申请公布日期
2016.06.09
申请号
WO2015KR13135
申请日期
2015.12.03
申请人
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人
KIM, SANG OUK;JIN, HYEONG MIN;LEE, KEON JAE;LEE, SEUNG HYUN;KIM, JU YOUNG