RESIST DEVELOPER AND DEVELOPING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resist developer which attains development in a relatively short development time even in the case of a practically allowable does of electron beams and gives an excellent pattern shape. SOLUTION: A mixed solvent comprising an aliphatic straight chain ether solvent or an aromatic ether solvent and a ketone solvent having >=5 carbon atoms is used as the resist developer.