| 摘要 |
PURPOSE:To enhance sensitivity to ionizing radiation, resolution, and adhesion to a substrate, and to improve developability by using a polymer obtained by participation of the Michael type reaction. CONSTITUTION:The present resist is composed of one or more polymers selected from ( I ) a polymer obtained by the Michael type addition reaction between a compd. having an unsatd. bond and a compd. having activated H, (II) a polymer obtained by said reaction of a compd. having both unsatd. bond. and activated H, and (III) a polymer or copolymer resulting from polymerization of a monomer obtained by said reaction between a compd. having an unsatd. bond and a compd. having activated H. These polymers obtained by the participation of the Michael type reaction are highly sensitive to the irradiation if high-energy electron beams shorter in wavelength than UV rays to cause decomposition reaction. As a result, the obtained polymers used for a positive type resist have high sensitivity to ionizing radiation, such as electron beams, high resolution, and superior adhesion to a substrate, and superior developability. |
