发明名称 PROCESSO PARA DEPOSITAR FILMES COMPREENDENDO DIAMANTE SOBRE UM SUBSTRATO
摘要 A process and apparatus that may be used for the production of diamond and doped diamond films at high rates by activated reactive vapor deposition. Carbon is evaporated in a vacuum chamber in the presence of atomic hydrogen containing plasma to form diamond precursors which then deposit on a substrate located within the vacuum chamber.
申请公布号 BR8804197(A) 申请公布日期 1989.03.14
申请号 BR19888804197 申请日期 1988.08.18
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 CHANDRA V. DESPHANDEY;ROINTAN F. BUNSHAH;HANS J. DOERR
分类号 C01B31/06;C23C14/06;C23C14/32;C30B25/02;C30B29/04 主分类号 C01B31/06
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