发明名称 |
PROCESSO PARA DEPOSITAR FILMES COMPREENDENDO DIAMANTE SOBRE UM SUBSTRATO |
摘要 |
A process and apparatus that may be used for the production of diamond and doped diamond films at high rates by activated reactive vapor deposition. Carbon is evaporated in a vacuum chamber in the presence of atomic hydrogen containing plasma to form diamond precursors which then deposit on a substrate located within the vacuum chamber. |
申请公布号 |
BR8804197(A) |
申请公布日期 |
1989.03.14 |
申请号 |
BR19888804197 |
申请日期 |
1988.08.18 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
CHANDRA V. DESPHANDEY;ROINTAN F. BUNSHAH;HANS J. DOERR |
分类号 |
C01B31/06;C23C14/06;C23C14/32;C30B25/02;C30B29/04 |
主分类号 |
C01B31/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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