发明名称 POLISHING APPARATUS HAVING OPTICAL MONITORING OF SUBSTRATES FOR UNIFORMITY CONTROL AND SEPARATE ENDPOINT SYSTEM
摘要 A computer-implemented method of generating reference spectra includes polishing a first substrate in a polishing apparatus having a rotatable platen, measuring a sequence of spectra from the substrate during polishing with an in-situ monitoring system, associating each spectrum in the sequence of spectra with a index value equal to a number of platen rotations at which the each spectrum was measured, and storing the sequence of spectra as reference spectra.
申请公布号 US2017100814(A1) 申请公布日期 2017.04.13
申请号 US201615385202 申请日期 2016.12.20
申请人 Applied Materials, Inc. 发明人 Qian Jun;Lee Harry Q.
分类号 B24B37/013;B24B37/10;B24B37/20;B24B37/04 主分类号 B24B37/013
代理机构 代理人
主权项
地址 Santa Clara CA US