| 摘要 |
A sintered compact characterized by comprising: zinc (Zn); gallium (Ga), aluminum (Al), or boron (B); germanium (Ge) or silicon (Si); magnesium (Mg); oxygen (O); and fluorine (F); and in satisfying the relationship 10 ≤ A + B + C ≤ 70, where A is the content of gallium (Ga), aluminum (Al), or boron (B) converted to mol% in terms of Ga2O3, Al2O3, or B2O3, B is the content of germanium (Ge) or silicon (Si) converted to mol% in terms of GeO2 or SiO2, and C is the content of magnesium (Mg) converted to mol% in terms of MgF2. In particular, a low-refractive-index amorphous thin film can be formed which has low bulk resistance and is capable of DC sputtering. |
