发明名称 IMPROVED PLASMA GENERATION APPARATUS AND RELATED IONOZATION METHOD
摘要 <p>PURPOSE: To obtain an ionization chamber for a plasma-generating device which is capable of pre-ionizing gas, without using constituent elements which may tend to possibly lower the reliability of a whole system. CONSTITUTION: An adequate ionization radiation source 47 is provided, so as to improve the capacity of this device, in an ionization chamber 21 for a plasma- generating device, used for utilization for ion propulsion or satellite discharge in a space field and on the ground. A radiation beam, emitted by the radiation source, creates constant ionization, having an advantage with respect to a preliminary ionization step, that is, both the starting time and operating step of the device, to standardize the capacity of a device by the continuation and regulation of the operation in particular.</p>
申请公布号 JPH0660839(A) 申请公布日期 1994.03.04
申请号 JP19930049167 申请日期 1993.03.10
申请人 PUROERU TECHNOL SPA 发明人 CHIRI JIANFURANKO
分类号 H01J27/02;F03H1/00;H01J37/08;H01J41/08;H05H1/26;(IPC1-7):H01J37/08 主分类号 H01J27/02
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