发明名称 Doped electrodes used to inhibit oxygen loss in ReRAM device
摘要 A nonvolatile memory device and method for forming a resistive switching memory element, with improved lifetime and switching performance. A nonvolatile memory element includes resistive switching layer formed between a first and second electrode. The resistive switching layer comprises a metal oxide. One or more electrodes include a dopant material to provide the electrode with enhanced oxygen-blocking properties that maintain and control the oxygen ion content within the memory element contributing to increased device lifetime and performance.
申请公布号 US9178142(B2) 申请公布日期 2015.11.03
申请号 US201313784465 申请日期 2013.03.04
申请人 Intermolecular, Inc. 发明人 Tendulkar Mihir
分类号 H01L45/00;H01L29/06;H01L27/22;H01L27/24 主分类号 H01L45/00
代理机构 代理人
主权项 1. A nonvolatile memory element, comprising: a first electrode layer; a second electrode layer; and a resistive switching layer disposed between the first electrode layer and the second electrode layer, wherein the first electrode directly interfaces the resistive switching layer,wherein the resistive switching layer comprises a metal oxide,wherein the first electrode layer comprises a nitride and a first dopant, wherein the first dopant comprises one or more of beryllium, boron, lithium, sodium, magnesium, or combinations thereof,wherein the first dopant is only present in a portion of the first electrode directly interfacing the resistive switching layer.
地址 San Jose CA US