发明名称 REDUCTIVE LOTION AND METHOD FOR PRODUCTION THEREOF
摘要 <p>A reductive lotion having an oxidation-reduction potential of -10 mV to -2000 mV; and a method for producing the reductive lotion which comprises dissolving a hydrogen gas into a lotion through pressuring a hydrogen gas of a temperature of -180°C to 90°C to 0.1 atm to 800 atm, and then returning the pressure and temperature of the hydrogen to an ordinary temperature and pressure. It is preferred that the reductive lotion has a pH of 9.0 or lower. The resultant lotion is a reductive lotion which has a very low oxidation-reduction potential and exhibits strong reducing property, even when it has a pH in a weekly acidic region.</p>
申请公布号 WO2006061880(A1) 申请公布日期 2006.06.15
申请号 WO2004JP18171 申请日期 2004.12.06
申请人 MUROTA, WATARU 发明人 MUROTA, WATARU
分类号 (IPC1-7):A61K7/00 主分类号 (IPC1-7):A61K7/00
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