| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an inspection device and an inspection method that enable more detailed inspection.SOLUTION: An inspection device according to an embodiment of the present invention is the inspection device that detects an inspected object used in an EUV mask, and comprises: a Schwarzs child optical system 10 that has a convex mirror 12 and a concave mirror 13 with a hole; a detector 14 that detects reflection light reflected upon the inspected object via the Schwarzs child optical system 10; and a recessed mirror 11 that is arranged on a side of the inspected object of the convex mirror 12, and reflects illumination light in a direction of the EUV mask for performing a dark field illumination. The inspection device further comprises means for changing an angle of incidence of the illumination light L1 with respect to the inspected object so that one part of illumination light L1 becomes bright field illumination light.</p> |
