发明名称 |
PROCESS FOR PREPARING FLUORINATED, INORGANIC HOLLOW NANOSPHERES USING WATER-BASED SILICA PRECURSORS |
摘要 |
The disclosure provides a process for preparing a fluorinated silica hollow nanosphere comprising: providing a mixture comprising water, at least one non-reactive solvent, at least one fluorosilane, at least one water based silica precursor solution, such as sodium silicate, potassium silicate, ammonium silicate or pre-formed silicic acid, and at least one surfactant; shearing the components of the mixture with high shear energy at an energy density of at least 10^6 J/m^3 to form a mini-emulsion; initiating a one-step sol-gel reaction by adjusting the pH to about 4 to 10 and then initiating a one-step sol-gel forming fluorinated hollow silica nanospheres having a particle size of less than about 400nm. |
申请公布号 |
WO2015138156(A1) |
申请公布日期 |
2015.09.17 |
申请号 |
WO2015US17903 |
申请日期 |
2015.02.27 |
申请人 |
E I DU PONT DE NEMOURS AND COMPANY |
发明人 |
LEE, HAU-NAN;LASIO, JELENA;RAGHAVANPILLAI, ANILKUMAR;BERNARD, STEPHANIE A |
分类号 |
C09C1/30 |
主分类号 |
C09C1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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