发明名称 PROCESS FOR PREPARING FLUORINATED, INORGANIC HOLLOW NANOSPHERES USING WATER-BASED SILICA PRECURSORS
摘要 The disclosure provides a process for preparing a fluorinated silica hollow nanosphere comprising: providing a mixture comprising water, at least one non-reactive solvent, at least one fluorosilane, at least one water based silica precursor solution, such as sodium silicate, potassium silicate, ammonium silicate or pre-formed silicic acid, and at least one surfactant; shearing the components of the mixture with high shear energy at an energy density of at least 10^6 J/m^3 to form a mini-emulsion; initiating a one-step sol-gel reaction by adjusting the pH to about 4 to 10 and then initiating a one-step sol-gel forming fluorinated hollow silica nanospheres having a particle size of less than about 400nm.
申请公布号 WO2015138156(A1) 申请公布日期 2015.09.17
申请号 WO2015US17903 申请日期 2015.02.27
申请人 E I DU PONT DE NEMOURS AND COMPANY 发明人 LEE, HAU-NAN;LASIO, JELENA;RAGHAVANPILLAI, ANILKUMAR;BERNARD, STEPHANIE A
分类号 C09C1/30 主分类号 C09C1/30
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