可有效减缓贾凡尼效应之蚀刻液;ETCHING SOLUTION CAPABLE OF EFFECTIVELY REDUCING GALVANIC EFFECT

摘要

本发明系关于一种可有效减缓贾凡尼效应之蚀刻液，其主要系藉由将特定比例的一蚀刻剂与一含氮五元杂环化合物溶于水而制成的蚀刻液；如此，当使用者应用此蚀刻液对包含至少一第一金属(例如金)与至少一第二金属(例如铜)之一基板进行湿式蚀刻时，该含氮五元杂环化合物会于具有较高还原电位之第一金属上形成一有机护膜，进而有效避免第二金属因受到贾凡尼效应(galvanic effect)之影响而导致过度蚀刻的现象; Thus, when at least one first metal (e.g., gold) and at least one second metal (e.g., copper) disposed on a substrate is treated with a wet etching process by using this etching solution, the nitrogen containing five-member heterocyclic compound would form an organic protection film on the first metal having higher reduction potential, so as to effectively avoid the second metal from being over etched resulted from the Galvanic effect.