发明名称 Film depositing apparatus
摘要 A film depositing apparatus comprises: a rotatable drum within a chamber around which a substrate is wrapped in a specified surface region; a film depositing unit comprising a film depositing electrode spaced facing to a surface of the drum, and a feed gas supply section supplying a feed gas for forming a film into a gap between the drum and the film depositing electrode; and an exhaust unit that exhausts the gap between the drum and the film depositing electrode during film formation by the film depositing unit so as to forcibly discharge the feed gas, supplied into the gap by the feed gas supply section, through at least one of end portions of the gap upstream side and downstream side in a rotating direction of the drum uniformly over an entire region of the gap in a direction parallel to the axis of rotation of the drum.
申请公布号 US8999062(B2) 申请公布日期 2015.04.07
申请号 US200912404022 申请日期 2009.03.13
申请人 FUJIFILM Corporation 发明人 Fujinami Tatsuya;Takahashi Toshiya
分类号 C23C16/503;C23C16/54;C23C16/509;C23C16/44;C23C16/455 主分类号 C23C16/503
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A film depositing apparatus comprising: a transport means that transports an elongated substrate in a specified transport path; a chamber; an evacuating unit that creates a specified degree of vacuum within the chamber; a rotatable drum that is provided within the chamber, that has an axis of rotation in a direction perpendicular to a transport direction of the substrate by the transport means, and around which the substrate transported by the transport means is wrapped in a specified surface region; a film depositing unit comprising a film depositing electrode spaced apart by a distance D from a surface of the drum and in a face-to-face relationship with the surface of the drum, said film depositing electrode having a first end at a most upstream direction of rotation of the drum and a second end at a most downstream direction of rotation of the drum a radio-frequency power source section for applying a radio-frequency voltage to the film depositing electrode, and a feed gas supply section from which a feed gas for forming a film is supplied into a gap between the drum and the film depositing electrode; and an exhaust box, said exhaust box separately formed from the film depositing unit and disposed in a first direction parallel to the axis of the rotation of the drum and being longer than the electrode in the first direction and said exhaust box having a longitudinal opening oriented in the first direction and said longitudinal opening also being longer than the electrode in the first direction, said longitudinal opening also having a width dimension larger than the distance D, said exhaust box disposed such that the longitudinal opening faces at least one of the first end and the second end of the film depositing electrode, wherein the longitudinal opening is oriented away from the surface of the drum, and wherein the electrode has a first segment adjacent to the first end, and said electrode is disposed so that the first segment is parallel to a tangent line to the surface of the drum, and wherein the exhaust box is disposed so that the width dimension of the longitudinal opening extends in a direction that is oriented to be parallel to a line running from the center of the drum to the first end of the electrode.
地址 Tokyo JP