发明名称 COATING AND DEVELOPING APPARATUS, OPERATING METHOD OF COATING AND DEVELOPING APPARATUS, AND STORAGE MEDIUM
摘要 <p>The present invention provides a technology to improve the productivity of a coating and developing apparatus. The coating and development apparatus comprises: a first returning tool and a second returning tool each of which conveys a substrate from a first placement module to a second placement module, and one of which is selected when a substrate is conveyed; a first processing module and a second processing module which receive a substrate from each of the first returning tool and the second returning tool, and which process the substrate; and a control unit. When a substrate is returned to the second placement module, the control unit controls each of the first and second returning tools by: calculating delays of the first returning tool and the second returning tool, wherein the delays are the time required until the substrate is ejected from the first processing module and the second processing module, selecting the returning tool having a shorter delay, and instructing the returning tool to return the substrate.</p>
申请公布号 KR20150032635(A) 申请公布日期 2015.03.27
申请号 KR20140123553 申请日期 2014.09.17
申请人 TOKYO ELECTRON LIMITED 发明人 KANEKO TOMOHIRO
分类号 G03F7/20;H01L21/027;H01L21/677 主分类号 G03F7/20
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