Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns

摘要

A hardmask composition includes a monomer represented by the following Chemical Formula 1 and an aromatic ring-containing polymer,;

主权项

1. A hardmask composition, comprising:
a monomer represented by the following Chemical Formula 1; and an aromatic ring-containing polymer, wherein, in the above Chemical Formula 1, A, A′ and A″ are each independently a substituted or unsubstituted aromatic cyclic group or aliphatic cyclic group, provided that at least one of the A and A′ is a substituted or unsubstituted pyrene group, a substituted or unsubstituted perylene group, a substituted or unsubstituted benzoperylene group, a substituted or unsubstituted coronene group, or a combination thereof, L and L′ are each independently a single bond or a substituted or unsubstituted C1 to C6 alkylene group, x=y=0 or x=y=1, and z is an integer of 1 to 5.