PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE

摘要

A photoresist composition containing a polymer having a structural unit including an acid-labile group, and a compound represented by the formula (1). In the formula (1), R1 represents a hydrogen atom or a monovalent acid-labile group. R2 represents an alicyclic hydrocarbon group having 3 to 20 carbon atoms and a valency of (m+1). m is an integer of 2 to 5. R3 and R4 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. n is an integer of 0 to 5. At least two of a plurality of R1 s optionally taken together represent a ring structure, together with a plurality of oxygen atoms bonding to R1 and the carbon atom(s) constituting R2 and bonding to these oxygen atoms. M+ represents a monovalent radiation-degradable onium cation.;

主权项

1. A photoresist composition, comprising:
a polymer comprising a structural unit that comprises an acid-labile group; and a compound represented by a formula (1): wherein, in the formula (1), R1 represents a hydrogen atom or a monovalent acid-labile group; R2 represents an alicyclic hydrocarbon group having 3 to 20 carbon atoms and a valency of (m+1); m is an integer of 2 to 5; R3 and R4 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; n is an integer of 0 to 5, wherein a plurality of R1s are identical to or different from each other, a plurality of R3s, in a case where R3 is present in a plurality of number, are identical to or different from each other, and a plurality of R4s, in a case where R4 is present in a plurality of number, are identical to or different from each other, and wherein at least two of the plurality of R1 s optionally taken together represent a ring structure by binding with each other, together with a plurality of oxygen atoms that bond to R′ and the carbon atom or carbon atoms constituting R2 and bonding to these oxygen atoms; and M+ represents a monovalent radiation-degradable onium cation.