UNIT FOR SUPPORTING A SUBSTRATE AND APPARATUS FOR ETCHING SUBSTRATE USING PLASMA WITH THE SAME

摘要

A substrate supporting unit and a plasma etching device having the same are disclosed. The substrate supporting unit according to an embodiment of the present invention comprises a substrate supporting unit in the processing chamber where etching of a substrate using a plasma takes place, and supporting the substrate; a cathode provided in the lower part of the substrate supporting unit; and a focus ring making the electric field even on the substrate by being provided at the edges of the substrate. The cathode comprises a top surface which is smaller than the substrate and provided at the lower part of the substrate supporting unit; and a stepped part which is formed in steps from the edges of the top surface downward. The focus ring is mounted in the stepped part and covers the sides of the stepped part and the edges of the substrate.