发明名称 | Semiconductor light emitting device and method for manufacturing same | ||
摘要 | According to one embodiment, a semiconductor light emitting device includes, a first semiconductor layer, a second semiconductor layer, a first electrode, a second electrode, a first interconnection, and a second interconnection. The first semiconductor layer has a first major surface, a second major surface provided on an opposite side to the first major surface, a protrusion selectively provided on the second major surface, and a trench formed from the second major surface to the first major surface. The second semiconductor layer is stacked on the protrusion of the first semiconductor layer and includes a light emitting layer. The first electrode is provided on the second major surface of the first semiconductor layer and a side surface of the trench. The second electrode is provided on a surface of the second semiconductor layer on an opposite side to the first semiconductor layer. | ||
申请公布号 | US8766310(B2) | 申请公布日期 | 2014.07.01 |
申请号 | US201012849098 | 申请日期 | 2010.08.03 |
申请人 | Kabushiki Kaisha Toshiba | 发明人 | Kojima Akihiro |
分类号 | H01L33/00 | 主分类号 | H01L33/00 |
代理机构 | White & Case LLP | 代理人 | White & Case LLP |
主权项 | 1. A semiconductor light emitting device comprising: a semiconductor layer having a first major surface, a second major surface provided on an opposite side to the first major surface, a protrusion including a light emitting layer and a depression provided on the second major surface, and a trench that extends from a bottom surface of the depression to the first major surface; a first electrode provided on the bottom surface of the depression of the semiconductor layer and a side surface of the trench; a second electrode provided on a surface of the protrusion of the semiconductor layer; a first interconnection provided on a surface of the first electrode, the first interconnection buried inside the first electrode in the trench; and a second interconnection provided on a surface of the second electrode. | ||
地址 | Tokyo JP |