发明名称 |
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS |
摘要 |
A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development. |
申请公布号 |
US2013209935(A1) |
申请公布日期 |
2013.08.15 |
申请号 |
US201313762859 |
申请日期 |
2013.02.08 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD.;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
SAGEHASHI MASAYOSHI;HATAKEYAMA JUN;HASEGAWA KOJI;KATAYAMA KAZUHIRO |
分类号 |
G03F7/004;G03F7/039;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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