| 摘要 |
In a method of treating a gas exhausted from a process chamber, the exhaust gas is conveyed to a vacuum pump (20) and a nitrogen purge gas is added to the exhaust gas for pumping with the exhaust gas. Gas exhaust from the pump is conveyed to an abatement device (28) for abating the exhaust gas. The amount of purge gas added to the exhaust gas is adjusted in response to a variation of the composition of the exhaust gas, or the composition of the gas supplied to the process chamber, to optimise the abatement of the exhaust gas.
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