| 发明名称 |
PHENOL MONOMER, POLYMER FOR FORMING A RESIST UNDERLAYER FILM INCLUDING SAME, AND COMPOSITION FOR A RESIST UNDERLAYER FILM INCLUDING SAME |
| 摘要 |
<p>Disclosed are a phenol monomer, a polymer for forming a resist underlayer film including same, and a composition for a resist underlayer film including same, which are to be used in a semiconductor lithography process. The phenol monomer is represented by chemical formula 1 in claim 1.</p> |
| 申请公布号 |
WO2013066067(A1) |
申请公布日期 |
2013.05.10 |
| 申请号 |
WO2012KR09111 |
申请日期 |
2012.11.01 |
| 申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
KIM, JEONG-SIK;LEE, JAE-WOO;KIM, JAE-HYUN |
| 分类号 |
C07D311/86;C07D495/10;C08G61/12;G03F7/004 |
主分类号 |
C07D311/86 |
| 代理机构 |
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| 主权项 |
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