APPARATUS AND METHOD FOR TREATING SUBSTRATE

摘要

PURPOSE: An apparatus for treating a substrate and a method thereof are provided to prevent a leaning phenomenon due to supercritical fluid by blocking the supercritical fluid from a substrate. CONSTITUTION: A housing(4100) provides a process space. A supporting member supports a substrate in the housing. A supply port supplies process fluid to the housing. An insulating member(4600) includes a shielding plate(4610) which is arranged between the supporting member and the supply port and blocks the process fluid from directly touching the substrate. An exhaust port exhausts the process fluid from the housing.