发明名称 THIN FILM TRANSISTOR, MANUFACTURING METHOD OF THE SAME, AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a thin film transistor which can satisfy both of improvement in charge injection efficiency and securement of performance in a source electrode/drain electrode and an organic semiconductor layer. <P>SOLUTION: A thin film transistor comprises: an organic semiconductor layer formed with a metal-containing material containing at least one of a metal element and a metalloid element which are capable of reacting with an etching gas; a source electrode and a drain electrode spaced at a distance from each other; and an organic conductive layer inserted between the organic semiconductor layer and the source electrode/drain electrode in a region where the organic semiconductor layer and the source electrode/drain electrode overlap each other, and formed with a non-metal-containing material not containing at least one of a metal element and a metalloid element which are capable of reacting with an etching gas. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013004564(A) 申请公布日期 2013.01.07
申请号 JP20110131103 申请日期 2011.06.13
申请人 SONY CORP 发明人 KATSUHARA MASAHISA
分类号 H01L29/786;G02F1/1368;H01L21/28;H01L29/417;H01L51/30;H01L51/40;H01L51/50;H05B33/08;H05B33/10 主分类号 H01L29/786
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