发明名称 |
THIN FILM TRANSISTOR, MANUFACTURING METHOD OF THE SAME, AND ELECTRONIC APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin film transistor which can satisfy both of improvement in charge injection efficiency and securement of performance in a source electrode/drain electrode and an organic semiconductor layer. <P>SOLUTION: A thin film transistor comprises: an organic semiconductor layer formed with a metal-containing material containing at least one of a metal element and a metalloid element which are capable of reacting with an etching gas; a source electrode and a drain electrode spaced at a distance from each other; and an organic conductive layer inserted between the organic semiconductor layer and the source electrode/drain electrode in a region where the organic semiconductor layer and the source electrode/drain electrode overlap each other, and formed with a non-metal-containing material not containing at least one of a metal element and a metalloid element which are capable of reacting with an etching gas. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013004564(A) |
申请公布日期 |
2013.01.07 |
申请号 |
JP20110131103 |
申请日期 |
2011.06.13 |
申请人 |
SONY CORP |
发明人 |
KATSUHARA MASAHISA |
分类号 |
H01L29/786;G02F1/1368;H01L21/28;H01L29/417;H01L51/30;H01L51/40;H01L51/50;H05B33/08;H05B33/10 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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