| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a diffusion treatment device which can perform efficient diffusion treatment without wasting a rare deposition raw material. <P>SOLUTION: This deposition treatment device (1) comprises: a treatment chamber (10) for accommodating a material to be treated; a first heating means (13) for heating the material (M) to be treated which is arranged in the treatment chamber; a first atmosphere-adjusting means for adjusting an atmosphere in the treatment chamber; a deposition source chamber (20) which is communicatively arranged at the treatment chamber and can accommodate the deposition source (D); an approximation moving means (21) which can move the deposition source between the treatment chamber and the deposition source chamber, and makes the deposition source approximate the material to be treated; a switching means (30) for switching communication between the treatment chamber and the deposition source chamber according to the movement of the deposition source; a second heating means (22) for heating the deposition source; and a second atmosphere-adjusting means for adjusting an atmosphere in the deposition source chamber. By this, the material to be treated and the deposition source can independently be heated, and can be made to approximate each other at arbitrary timing, and accordingly, a freedom of deposition is extremely raised, thus enabling the efficient deposition treatment or the like. <P>COPYRIGHT: (C)2012,JPO&INPIT |
