| 摘要 |
PURPOSE: A mask lay-out revising method and apparatus is provided to accurately estimate edge skew by considering the topology shape of a mask pattern. CONSTITUTION: Two dimensional geometric information of a mask pattern is obtained(S110). An ADI(After Develop Inspection) image parameter of the mask pattern is obtained(S120). Edge skew is calculated by using the two dimensional geometric information and the ADI image parameter(S130). The two dimensional geometric information comprises at least one among a visible kernel, a blocked kernel, and a density kernel. The ADI image parameter comprises at least one among ILS(Image Log Slope), Islope, Imax, Imain, Icurv, CD(Critical Dimension), and contrast.
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