| 摘要 |
PURPOSE: A thin film depositing apparatus is provided to increase a PM(Preventive Maintenance) cycle by preventing unnecessary thin film deposition in a ceiling of a chamber. CONSTITUTION: A gas supply unit(130) includes first to third gas inlets, a first spray unit(134), a second spray unit(135), and a third spray unit(136). The first to third gases are inputted to the upper center of a susceptor through the first to third gas inlets. The first spray unit sprays the first gas to the upper side of the susceptor. The second spray unit sprays the second gas from the lower side of the first spray unit to the upper side of the susceptor. The third spray unit is extended from the third gas inlet. |
