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发明名称
Gas-separating plate for reactor for manufacturing semiconductor
摘要
申请公布号
USD655260(S1)
申请公布日期
2012.03.06
申请号
US201129389564F
申请日期
2011.04.13
申请人
HONMA MANABU;HISHIYA KATSUYUKI;TOKYO ELECTRON LIMITED
发明人
HONMA MANABU;HISHIYA KATSUYUKI
分类号
主分类号
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