PATTERN INSPECTION DEVICE, PATTERN INSPECTION METHOD AND STRUCTURE WITH PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a pattern inspection device with which the inspection sensitivity can be enhanced.

SOLUTION: A pattern inspection device includes a first extraction part 33 for extracting data of patter which is under the limit of resolution from first detection data and first delay data, a first output displacement calculating part 34a which calculates the average value of the output level of the peripheral region with respect to pixels to be marked of data corresponding to the first detection data extracted and calculates the difference of the output level of the data corresponding to the first detection data extracted and the average value, and a second output displacement calculating part 34b which calculates the average value of the output level of the peripheral region with respect to the pixels to be marked of the data corresponding to the first delay data extracted and calculates the difference between the output level of the data corresponding to the first delay data extracted and the average value. A pattern defect is detected based on the calculation results of the first and second output displacement calculating parts.

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