发明名称 Substrate hold apparatus and method for judging substrate push-up state
摘要 A substrate hold apparatus is provided an electrostatic chuck for electrostatically attracting and holding a substrate thereon, a push-up member contactable with a position of vicinity of an edge of the substrate on the electrostatic chuck from below for pushing up the substrate, a drive apparatus for driving at least one of the electrostatic chuck and push-up member to thereby allow the push-up member to push up the substrate, a force sensor for detecting a force applied to the push-up member in an pushing-up operation, and a control unit wherein the control unit is configured to measure the force from the force sensor as a first measurement, output a normal state signal when the measured force in the first measurement is equal to or larger than a lower limit value and is equal to or smaller than a upper limit value.
申请公布号 US8040655(B2) 申请公布日期 2011.10.18
申请号 US20080021817 申请日期 2008.01.29
申请人 NISSIN ION EQUIPMENT CO., LTD. 发明人 WEIJIANG ZHAO;TAURA AI
分类号 H01L21/683 主分类号 H01L21/683
代理机构 代理人
主权项
地址
您可能感兴趣的专利