| 摘要 |
<p>In an electrode portion structure (11A,11B) in which an electrode (13) is formed in an end portion of a through-wiring, disconnection is prevented in an electrode portion. A through-hole (16) that vertically pierces a substrate (12) is made in the substrate (12), and a through-electrode (15) is provided in the through-hole (16). The through-electrode (15) is projected in s curved-surface manner from an upper surface of the substrate (12). The upper surface of the substrate (12) is coated with an insulating film (18), and a contact hole (19) is made in the insulating film (18) while aligned with the through-electrode (15). An opening diameter of the contact hole (19) is lower than a sectional diameter of the through-electrode (15), and surroundings of an upper surface of the through-electrode (15) are coated with the contact hole (19). A thickness Ddiel of the insulating film (18) is equal to or lower than a projection length Dp of the through-electrode (15) from the upper surface of the substrate at an opening edge of the contact hole (19). Additionally, assuming that Dtsv is a projection length (maximum projection length) of an apex of the through-electrode (15) from the upper surface of the substrate, the projection length Dtsv is adjusted so as to become 0 ‰¤ Dtsv ‰¤ Ddiel + Dp (Dp > 0).</p> |
