发明名称 |
METHOD FOR PROCESSING WASTE SOLUTION IN PLATE-MAKING PROCESS OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
摘要 |
Disclosed is a method for processing waste solution in the plate-making process of a photosensitive lithographic printing plate, wherein the maintenance performance of the equipment is excellent. Specifically disclosed is a method for processing waste solution in the plate-making process, wherein the waste solution in the plate-making process, which is discharged when the plate-making process of a photosensitive lithographic printing plate is carried out using a developer liquid for a photosensitive lithographic printing plate, said developer liquid being characterized by containing at least one sugar selected from non-reducing sugars and at least one base without containing a silicate and by having a pH within the range of 9.0-13.5, is evaporated and concentrated by an evaporative concentration apparatus, thereby being separated into water vapor and the dissolved component. In the method for processing waste solution in the plate-making process, the waste solution in the plate-making process is heated by a heating means in an evaporation pot that is provided with base resistance and the water vapor separated from the waste solution in the plate-making process is taken out of the evaporation pot and condensed in a cooling means, thereby being turned into reclaimed water. |
申请公布号 |
WO2011036923(A1) |
申请公布日期 |
2011.03.31 |
申请号 |
WO2010JP60396 |
申请日期 |
2010.06.18 |
申请人 |
FUJIFILM CORPORATION;AOSHIMA, NORIO;WATANABE, TOSHIHIRO;KOBAYASHI, FUMIKAZU |
发明人 |
AOSHIMA, NORIO;WATANABE, TOSHIHIRO;KOBAYASHI, FUMIKAZU |
分类号 |
G03F7/30;G03F7/32 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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