发明名称 METHOD FOR PROCESSING WASTE SOLUTION IN PLATE-MAKING PROCESS OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 Disclosed is a method for processing waste solution in the plate-making process of a photosensitive lithographic printing plate, wherein the maintenance performance of the equipment is excellent. Specifically disclosed is a method for processing waste solution in the plate-making process, wherein the waste solution in the plate-making process, which is discharged when the plate-making process of a photosensitive lithographic printing plate is carried out using a developer liquid for a photosensitive lithographic printing plate, said developer liquid being characterized by containing at least one sugar selected from non-reducing sugars and at least one base without containing a silicate and by having a pH within the range of 9.0-13.5, is evaporated and concentrated by an evaporative concentration apparatus, thereby being separated into water vapor and the dissolved component. In the method for processing waste solution in the plate-making process, the waste solution in the plate-making process is heated by a heating means in an evaporation pot that is provided with base resistance and the water vapor separated from the waste solution in the plate-making process is taken out of the evaporation pot and condensed in a cooling means, thereby being turned into reclaimed water.
申请公布号 WO2011036923(A1) 申请公布日期 2011.03.31
申请号 WO2010JP60396 申请日期 2010.06.18
申请人 FUJIFILM CORPORATION;AOSHIMA, NORIO;WATANABE, TOSHIHIRO;KOBAYASHI, FUMIKAZU 发明人 AOSHIMA, NORIO;WATANABE, TOSHIHIRO;KOBAYASHI, FUMIKAZU
分类号 G03F7/30;G03F7/32 主分类号 G03F7/30
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