COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

摘要

PURPOSE: An anti-reflective composition, a coated substrate using thereof, and a formation method of a photoresist relief image are provided to develop the compositing with an aqueous alkali developer. CONSTITUTION: A coated substrate using an anti-reflective composition comprises the following: a coating composition layer containing tetrapolymer with four different functional groups; and a photoresist layer located on the coating composition layer. An aqueous alkali developer for a photoresist also develops the coating composition layer. The substrate comprises the tetrapolymer containing polymerization units including maleimide, 9-anthracene-methylmethacrylate, 2-hydroxynaphthalene-methylmethacrylate, and t-butyl acrylate.