| 发明名称 |
Polishing Pad With Optical Sensor |
| 摘要 |
A polishing pad having an optical assembly that does not cause excess wear on a wafer workpiece. The optical assembly is disposed within the pad such that it may move in response to forces applied to the optical assembly. |
| 申请公布号 |
KR100973126(B1) |
申请公布日期 |
2010.07.29 |
| 申请号 |
KR20047018378 |
申请日期 |
2003.05.12 |
| 申请人 |
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发明人 |
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| 分类号 |
B24B49/00;B24B49/12;B24D7/12;B24D13/14;H01L21/304 |
主分类号 |
B24B49/00 |
| 代理机构 |
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代理人 |
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