发明名称 SUBSTRATE, SUBSTRATE HOLDING APPARATUS, ANALYSIS APPARATUS, PROGRAM, DETECTION SYSTEM, SEMICONDUCTOR DEVICE, DISPLAY APPARATUS, AND SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate, a substrate holding apparatus, an analysis apparatus, a program, a detection system, a semiconductor device, a display apparatus and a semiconductor manufacturing apparatus, which can detect or analyze information regarding the temperature of a substrate that can be used in an environment where the substrate has a high temperature and prevent decrease in the flexibility in the processing work of the substrate. SOLUTION: A plurality of resonators 5 are placed on a wafer W. The resonators 5 are each equipped with a base rectangular, in plan view, and a capacitor 52 and an inductor 53 which are formed on the base 51, and form an LC tank circuit. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010135419(A) 申请公布日期 2010.06.17
申请号 JP20080307823 申请日期 2008.12.02
申请人 PHILTECH INC;SHINKO ELECTRIC IND CO LTD 发明人 FURUMURA YUJI;MURA NAOMI;TAMAGAWA TERUKI;YOSHIKAWA TADAYOSHI;YONEKURA HIROSHI
分类号 H01L21/66 主分类号 H01L21/66
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