发明名称 INSULATION COVERING STRUCTURE FOR A SEMICONDUCTOR ELEMENT WITH A SINGLE DIE DIMENSION AND A MANUFACTURING METHOD THEREOF
摘要 An insulation covering structure for a semiconductor element with a single die dimension includes: a semiconductor element with a single die dimension and an insulation covering layer. The semiconductor element has a front side surface, a rear side surface, a left side surface, a right side surface, a bottom surface, and a top surface. The top surface of the semiconductor element has two metal pads. The insulation covering layer covers the front side surface, the rear side surface, the left side surface, the right side surface, and the bottom surface of the semiconductor element. A manufacturing process for covering the semiconductor element with a single die dimension is also disclosed.
申请公布号 US2010078798(A1) 申请公布日期 2010.04.01
申请号 US20080241492 申请日期 2008.09.30
申请人 INPAQ TECHNOLOGY CO., LTD. 发明人 WU LIANG-CHIEH;FENG HUI-MING
分类号 H01L23/48;H01L21/58 主分类号 H01L23/48
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