Resist composition containing a sulfonium compound, pattern-forming method using the resist composition, and sulfonium compound

摘要

A resist composition includes (A) a compound represented by the following formula (I): wherein each of R 1 to R 13 independently represents a hydrogen atom or a substituent, provided that at least one of R 1 to R 13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X - represents an anion containing a proton acceptor functional group.