发明名称 ELECTROLESS PALLADIUM PLATING SOLUTION
摘要 <p>ELECTROLESS PALLADIUM PLATING SOLUTION To provide an electroless palladium plating solution capable of forming a pure palladium plating film directly on an electroless nickel plating film without (pre-)treatment such as substituted palladium plating treatment or the like, which pure palladium plating film has good adhesion and small variations in plating film thickness.[Means to Solve the Problem] An electroless palladium plating solution comprising: a first complexing agent, a second complexing agent, phosphoric acid or a phosphate, sulfuric acid or a sulfate, and formic acid or a formate; the first complexing agent being an organopalladium complex having ethylenediamine as a ligand ; the second complexing agent being a chelating agent having a carboxyl group or a salt thereof and/or a water-soluble aliphatic organic acid or a salt thereof. Selected Figure : None</p>
申请公布号 SG150463(A1) 申请公布日期 2009.03.30
申请号 SG20080059909 申请日期 2008.08.13
申请人 KOJIMA CHEMICALS CO., LTD 发明人 KOJIMA KAZUHIRO;WATANABE HIDETO
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