发明名称 |
CONTAMINANT REMOVING METHOD, AND EXPOSURE METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a contaminant removing method with which contaminants adhered to a prescribed optical member in an optical system can be quickly removed. <P>SOLUTION: The contaminant removing method of removing contaminants adhering to a surface of the optical member in the optical system includes a first process of measuring prescribed optical characteristics of the optical system and judging whether the contaminants adhering to the optical member are removed on the basis of the measurement result; a second process of removing the contaminants adhering to the optical member using prescribed cleaning fluid; a third process of removing the cleaning fluid from the optical member; and a fourth process of finding information regarding contaminants remaining on the optical member. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009027196(A) |
申请公布日期 |
2009.02.05 |
申请号 |
JP20080274976 |
申请日期 |
2008.10.24 |
申请人 |
NIKON CORP |
发明人 |
HAMAYA MASATO;WATANABE SHUNJI;KITAMOTO TATSUYA |
分类号 |
H01L21/027;G02B1/11;G02B27/00;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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