发明名称 CONTAMINANT REMOVING METHOD, AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a contaminant removing method with which contaminants adhered to a prescribed optical member in an optical system can be quickly removed. <P>SOLUTION: The contaminant removing method of removing contaminants adhering to a surface of the optical member in the optical system includes a first process of measuring prescribed optical characteristics of the optical system and judging whether the contaminants adhering to the optical member are removed on the basis of the measurement result; a second process of removing the contaminants adhering to the optical member using prescribed cleaning fluid; a third process of removing the cleaning fluid from the optical member; and a fourth process of finding information regarding contaminants remaining on the optical member. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009027196(A) 申请公布日期 2009.02.05
申请号 JP20080274976 申请日期 2008.10.24
申请人 NIKON CORP 发明人 HAMAYA MASATO;WATANABE SHUNJI;KITAMOTO TATSUYA
分类号 H01L21/027;G02B1/11;G02B27/00;G03F7/20 主分类号 H01L21/027
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