| 摘要 |
PROBLEM TO BE SOLVED: To provide a conveying/processing apparatus capable of avoiding a liquid from a wet unit. SOLUTION: An outlet 23 of a decompression chamber 20 has a vertical size set within a range avoiding contact of its top edge with the liquid (developing solution) supplied on the surface of a substrate W. Therefore, because the clearance between the top face of the substrate W and the top edge of the outlet 23 becomes small when the substrate W passes through the outlet 23 and the interior of the decompression chamber 20 has a negative pressure, atmosphere rushes into the decompression chamber 20 along the top surface of the substrate W so that the flow of the atmosphere causes the developing solution put on the surface of the substrate W to flow and fall from the long side of the substrate W. The developing solution thus caused to flow and fall is collected through a collection port 24. COPYRIGHT: (C)2007,JPO&INPIT |
