PATTERN SUBSTRATE MANUFACTURING APPARATUS HAVING DUMMY AREA AND PATTERN SUBSTRATE MANUFACTURING METHOD USING THE SAME

摘要

A pattern substrate manufacturing apparatus having a dummy area and a pattern substrate manufacturing method using the same are provided to prevent the generation of the spots at the edge pixel of the color filter by preventing the fault ink from being loaded on the pattern formation area. A pattern substrate manufacturing apparatus having a dummy area comprises the driving stage(10), the dummy pattern region part(20), the pattern region substrate mounting section(30), the ink-jet head(40). The driving stage is driven along the scan progressive direction at the predetermined feeding speed. The dummy pattern region part is installed along the lateral part of the driving stage. The dummy pattern region part includes the ink absorption hole(21) along the longitudinal direction. The pattern region substrate mounting section is installed in order to be spaced from the dummy pattern region part. The pattern region substrate mounting section includes the pattern region substrate(31) to form a pattern. The non-significant ink is discharged on the dummy pattern region part. The valid ink is discharged on the pattern region top of the substrate.